薄膜材料デバイス研究会　プロシーディングス

第8回研究集会 (2011年度) (Proceedings of the Eighth Thin-Films Materials and Devices Meeting)

• 120223055-01 -05
  Surface Passivation of Crystalline Silicon by Micro Crystalline Silicon Deposition Followed by High-Pressure H₂O Vapor Heat Treatment
  T. Nagao¹, T. Sameshima¹, Y. Andoh², A. Shuku² and E. Takahashi^{2
  1} Tokyo University of Agriculture and Technology, 2-24-16, Nakachou, Koganei, Tokyo 184-8588, Japan
  ² NISSIN Electric Co., Ltd, 47, Takazechou, Umezu, Kyoto, 615-8686, Japan
  

• 120223112-01 -05
  Improvement in Electrical Characteristics of Microcrystalline Silicon Thin Film Transistors by High-Pressure H₂O Vapor Heat Treatment
  A. Shuku¹, E. Takahashi¹, Y. Andoh¹, Y. Nagatomi² and T. Sameshima^{2
  1} NISSIN Electric Co., Ltd, 47, Umezu-Takase-cho, Ukyo-ku, Kyoto, 615-8686, Japan
  ² Tokyo University of Agriculture and Technology, 2-24-16, Naka-cho, Koganei, Tokyo, 184-8588